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Contents

- Newton and Fizeau Interferometers
- Twyman-Green Interferometer
- Common Path Interferometers
- Lateral Shearing Interferometers
- Radial, Rotational, and Reversal Shear Interferometers
- Multiple Pass Interferometers
- Foucault and Wire Tests
- Ronchi Test
- Hartmann and Other Screen Tests
- Star Tests
- Holographic Tests
- Phase Shifting Interferometers
- Null Tests with and without Compensators
- Testing of Prisms
- Measurements of Curvatures and Focal Lengths
- Review Articles ... Read more

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This practical reference offers state-of-the-art coverage of speckle metrology and its value as a measuring technique in industry.;Examing every important aspect of the field, Speckle Metrology: surveys the origin of speckle displacement and decorrelation; presents procedures for deformation analysis and shape measurement of rough objects; explains particle image velocimetry (PIV), the processing of PIV records, and the design requirements of PIV equipment; discusses the applications of white light speckle methods and the production of artificial speckles; describes the measurement of surface roughness with laser speckles and polychromatic speckles; illustrates semiautomatic and automatic methods for the analysis of Young's fringes; calculates the variation of Young's fringes with the change in the microrelief of the rough surface; and explicates hololenses for imaging and provides design details with aberration corrections for hololense systems.;With over 1500 literature citations, tables, figures and display equations, Speckle Metrology is a resource for students and professionals in the fields of optical, mechanical, electrical and electronics engineering; applied physics; and stress analysis. ... Read more

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The Symposium on Frequency Standards and Metrology serves asan international forum for discussion of precision frequency standardsthroughout the electromagnetic spectrum and associated metrology. Thesymposium focuses on the fundamental aspects of the latest ideas,results and applications in relation to these frequency standards. ... Read more

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Topics in this volume include: comparison of interferometric contouring techniques; comparison of visibility of standard scratches; and near-grazing illumination and shadowing of rough surfaces. ... Read more

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This volume collects refereed contributions based on the presentations made at the Sixth Workshop on Advanced Mathematical and Computational Tools in Metrology, held at the Istituto di Metrologia "G. Colonnetti" (IMGC), Torino, Italy, in September 2003. It provides a forum for metrologists, mathematicians and software engineers that will encourage a more effective synthesis of skills, capabilities and resources, and promotes collaboration in the context of EU programmes, EUROMET and EA projects, and MRA requirements. It contains articles by an important, worldwide group of metrologists and mathematicians involved in measurement science and, together with the five previous volumes in this series, constitutes an authoritative source for the mathematical, statistical and software tools necessary to modern metrology. ... Read more

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This scarce antiquarian book is a selection from Kessinger Publishings Legacy Reprint Series. Due to its age, it may contain imperfections such as marks, notations, marginalia and flawed pages. Because we believe this work is culturally important, we have made it available as part of our commitment to protecting, preserving, and promoting the worlds literature. Kessinger Publishing is the place to find hundreds of thousands of rare and hard-to-find books with something of interest for everyone! ... Read more

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This is a contributed reference work from international authorsfrom both industry and academia. It deals with materials metrology andstandards for engineering design. This includes examination ofmetrological considerations as well as investigating the manymeasurement and control techniques. It will be of interest to allmaterials scientists and engineers from graduates to experiencedprofessionals and will be particularly useful to all those involvedwith measurement instrumentation. ... Read more

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All papers have been peer-reviewed. As the semiconductor industry continues to move toward silicon nanoelectronics and beyond, the introduction of new materials, innovative processing and assembly, and novel devices brings formidable metrology challenges. We have entered an era where nanotechnology is required to meet the demand for smaller, faster, cheaper, and more complex functional chips. Innovative metrology and characterization methods have become critical. This book emphasizes the frontiers of innovation in the characterization and metrology needed to advance nanoelectronics. It comprises applications in nanoelectronic materials and devices, research and development,and manufacturing and diagnostics. Novel characterization methods for beyond CMOS and extreme CMOS devices are addressed, as well as electrical measurements, gate dielectrics, interconnects, lithography, microscopy, and scanning probes. The Editors believe that this book of collected papers from world-class leaders provides a basis and effective portrayal of the industry s characterization and metrology needs and how they are being addressed by industry, academia, and government to continue the dramatic progress in semiconductors into the nanoelectronic regime. It also provides a foundation for stimulating further advances in metrology and new ideas for research and development.